{"product_id":"high-k-gate-dielectric-materials-applications-with-advanced-metal-oxide-semiconductor-field-effect-transistors-mosfets-9781771888431","title":"High-K Gate Dielectric Materials: Applications with Advanced Metal Oxide Semiconductor Field Effect Transistors (Mosfets)","description":"\u003cp\u003e • Author(s): Niladri Pratap Maity\u003cbr\u003e • Publisher: Taylor \u0026amp; Francis\u003cbr\u003e • Publisher Imprint: Apple Academic Press\u003cbr\u003e • BISAC: Physics - General\u003c\/p\u003e\u003cp\u003e\u003c\/p\u003e\u003cp\u003eThis volume explores and addresses the challenges of high-k gate dielectric materials, one of the major concerns in the evolving semiconductor industry and the International Technology Roadmap for Semiconductors (ITRS). The application of high-k gate dielectric materials is a promising strategy that allows further miniaturization of microelectronic components.\u003c\/p\u003e\u003cp\u003eThis book presents a broad review of SiO2 materials, including a brief historical note of Moore's law, followed by reliability issues of the SiO2 based MOS transistor. It goes on to discuss the transition of gate dielectrics with an EOT 1 nm and a selection of high-k materials. A review of the various deposition techniques of different high-k films is also discussed. High-k dielectrics theories (quantum tunneling effects and interface engineering theory) and applications of different novel MOSFET structures, like tunneling FET, are also covered in this book.\u003c\/p\u003e\u003cp\u003eThe volume also looks at the important issues in the future of CMOS technology and presents an analysis of interface charge densities with the high-k material tantalum pentoxide. The issue of CMOS VLSI technology with the high-k gate dielectric materials is covered as is the advanced MOSFET structure, with its working structure and modeling.\u003c\/p\u003e\u003cp\u003eThis timely volume will prove to be a valuable resource on both the fundamentals and the successful integration of high-k dielectric materials in future IC technology.\u003c\/p\u003e","brand":"Taylor \u0026 Francis","offers":[{"title":"Hardcover","offer_id":45240821514391,"sku":"9781771888431","price":10293.0,"currency_code":"INR","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0666\/3471\/1191\/files\/9781771888431.webp?v=1769226725","url":"https:\/\/atlanticbooks.com\/products\/high-k-gate-dielectric-materials-applications-with-advanced-metal-oxide-semiconductor-field-effect-transistors-mosfets-9781771888431","provider":"Atlantic Books","version":"1.0","type":"link"}