{"product_id":"microelectronic-applications-of-chemical-mechanical-planarization-9780471719199","title":"Microelectronic Applications of Chemical Mechanical Planarization","description":"\u003cp\u003e • Author(s): Yuzhuo Li\u003cbr\u003e • Publisher: Wiley-Interscience\u003cbr\u003e • Publisher Imprint: Wiley-Interscience\u003cbr\u003e • BISAC: Chemical \u0026amp; Biochemical\u003c\/p\u003e\u003cp\u003eAn authoritative, systematic, and comprehensive description of current CMP technology\u003cbr\u003e \u003cbr\u003e Chemical Mechanical Planarization (CMP) provides the greatest degree of planarization of any known technique. The current standard for integrated circuit (IC) planarization, CMP is playing an increasingly important role in other related applications such as microelectromechanical systems (MEMS) and computer hard drive manufacturing. This reference focuses on the chemical aspects of the technology and includes contributions from the foremost experts on specific applications. After a detailed overview of the fundamentals and basic science of CMP, Microelectronic Applications of Chemical Mechanical Planarization:\u003cbr\u003e *\u003cbr\u003e \u003cbr\u003e Provides in-depth coverage of a wide range of state-of-the-art technologies and applications\u003cbr\u003e *\u003cbr\u003e \u003cbr\u003e Presents information on new designs, capabilities, and emerging technologies, including topics like CMP with nanomaterials and 3D chips\u003cbr\u003e *\u003cbr\u003e \u003cbr\u003e Discusses different types of CMP tools, pads for IC CMP, modeling, and the applicability of tribometrology to various aspects of CMP\u003cbr\u003e *\u003cbr\u003e \u003cbr\u003e Covers nanotopography, CMP performance and defect profiles, CMP waste treatment, and the chemistry and colloidal properties of the slurries used in CMP\u003cbr\u003e *\u003cbr\u003e \u003cbr\u003e Provides a perspective on the opportunities and challenges of the next fifteen years\u003cbr\u003e \u003cbr\u003e Complete with case studies, this is a valuable, hands-on resource for professionals, including process engineers, equipment engineers, formulation chemists, IC manufacturers, and others. With systematic organization and questions at the end of each chapter to facilitate learning, it is an ideal introduction to CMP and an excellent text for students in advanced graduate courses that cover CMP or related semiconductor manufacturing processes.\u003c\/p\u003e","brand":"Wiley-Interscience","offers":[{"title":"Hardcover","offer_id":45203895189655,"sku":"9780471719199","price":19622.0,"currency_code":"INR","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0666\/3471\/1191\/files\/9780471719199.webp?v=1767308293","url":"https:\/\/atlanticbooks.com\/products\/microelectronic-applications-of-chemical-mechanical-planarization-9780471719199","provider":"Atlantic Books","version":"1.0","type":"link"}