{"product_id":"nano-cmos-gate-dielectric-engineering-9781439849590","title":"Nano-CMOS Gate Dielectric Engineering","description":"\u003cp\u003e • Author(s): Hei Wong\u003cbr\u003e • Publisher: Taylor \u0026amp; Francis\u003cbr\u003e • Publisher Imprint: CRC Press\u003cbr\u003e • BISAC: Electronics - Microelectronics\u003c\/p\u003e\u003cp\u003e\u003c\/p\u003e\u003cp\u003eAccording to Moore's Law, not only does the number of transistors in an integrated circuit double every two years, but transistor size also decreases at a predictable rate. At the rate we are going, the downsizing of CMOS transistors will reach the deca-nanometer scale by 2020. Accordingly, the gate dielectric thickness will be shrunk to less than half-nanometer oxide equivalent thickness (EOT) to maintain proper operation of the transistors, leaving high-k materials as the only viable solution for such small-scale EOT. \u003c\/p\u003e\u003cp\u003eThis comprehensive, up-to-date text covering the physics, materials, devices, and fabrication processes for high-k gate dielectric materials, \u003cstrong\u003eNano-CMOS Gate Dielectric Engineering\u003c\/strong\u003e systematically describes how the fundamental electronic structures and other material properties of the transition metals and rare earth metals affect the electrical properties of the dielectric films, the dielectric\/silicon and the dielectric\/metal gate interfaces, and the resulting device properties. Specific topics include the problems and solutions encountered with high-k material thermal stability, defect density, and poor initial interface with silicon substrate. The text also addresses the essence of thin film deposition, etching, and process integration of high-k materials in an actual CMOS process.\u003c\/p\u003e\u003cp\u003eFascinating in both content and approach, \u003cstrong\u003eNano-CMOS Gate Dielectric Engineering\u003c\/strong\u003e explains all of the necessary physics in a highly readable manner and supplements this with numerous intuitive illustrations and tables. Covering almost every aspect of high-k gate dielectric engineering for nano-CMOS technology, this is a perfect reference book for graduate students needing a better understanding of developing technology as well as researchers and engineers needing to get ahead in microelectronic engineering and materials science. \u003c\/p\u003e","brand":"Taylor \u0026 Francis","offers":[{"title":"Hardcover","offer_id":45235901956247,"sku":"9781439849590","price":10604.0,"currency_code":"INR","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0666\/3471\/1191\/files\/9781439849590.webp?v=1769211305","url":"https:\/\/atlanticbooks.com\/products\/nano-cmos-gate-dielectric-engineering-9781439849590","provider":"Atlantic Books","version":"1.0","type":"link"}