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Advances in CMP Polishing Technologies

by Toshiro Doi
Save 40% Save 40%
Current price ₹10,723.00
Original price ₹17,871.00
Original price ₹17,871.00
Original price ₹17,871.00
(-40%)
₹10,723.00
Current price ₹10,723.00

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Book cover type: Hardcover
  • ISBN13: 9781437778595
  • Binding: Hardcover
  • Subject: N/A
  • Publisher: William Andrew
  • Publisher Imprint: William Andrew
  • Publication Date:
  • Pages: 328
  • Original Price: USD 185.0
  • Language: English
  • Edition: N/A
  • Item Weight: 545 grams
  • BISAC Subject(s): Materials Science / General, Environmental Science, and Physics / General

CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. Advances in CMP/Polishing Technologies for Manufacture of Electronic Devices presents the latest developments and technological innovations in the field - making cutting-edge R&D accessible to the wider engineering community.

Most of the applications of these processes are kept as confidential as possible (proprietary information), and specific details are not seen in professional or technical journals and magazines. This book makes these processes and applications accessible to a wider industrial and academic audience.

Building on the fundamentals of tribology - the science of friction, wear and lubrication - the authors explore the practical applications of CMP and polishing across various market sectors. Due to the high pace of development of the electronics and semiconductors industry, many of the presented processes and applications come from these industries.

Marinescu, Ioan D.: - Ioan D. Marinescu is Professor and Director of the Precision Micromachining Center at The University of Toledo, Ohio, USA, and CEO of Advanced Manufacturing Solutions, LLC. His research interests include manufacturing processes, grinding, tribology, advanced materials, and machining of brittle materials.

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