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Chemical Processing of Dielectrics, Insulators and Electronic Ceramics: Volume 606

by Anthony C. Jones , Janice Veteran , Donald Mullin
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Current price ₹3,603.00
Original price ₹3,640.00
Original price ₹3,640.00
Original price ₹3,640.00
(-1%)
₹3,603.00
Current price ₹3,603.00

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Book cover type: Paperback
  • ISBN13: 9781107413207
  • Binding: Paperback
  • Subject: N/A
  • Publisher: Cambridge University Press
  • Publisher Imprint: Cambridge University Press
  • Publication Date:
  • Pages: 328
  • Original Price: GBP 28.0
  • Language: English
  • Edition: N/A
  • Item Weight: 440 grams
  • BISAC Subject(s): Electronics / General

This book focuses on the creative use of chemistry in the fabrication of a variety of oxide and non-oxide materials which are likely to play a crucial role in the development of the next generation of microelectronics devices. It includes inorganic precursor chemistry, gas-phase and solid-state chemistry, materials science, chemical physics and chemical engineering. Highlights include the deposition of high-k dielectric gate oxides, ferroelectric oxide films for infrared and memory applications, low-k dielectrics, TiN and TaN diffusion barriers, and fresh precursors for III-V nitrides. The emphasis is on chemical methods for the controlled deposition of thin films, for which chemical vapor deposition (CVD) has proven to be a useful and versatile technique. Of particular interest is the use of liquid-injection MOCVD for the deposition of oxide multilayers and superlattices. Solution deposition techniques such as sol-gel, metalorganic decomposition (MOD), hydrothermal processing are also prominently featured. Topics include: CVD of oxide ceramics; CVD of nonoxide ceramics; solution deposition of electronic ceramics; alternative chemical processing methods and characterization of electronic ceramics..

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