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Polysulfones as X-Ray Resists

by Gina Calderon Wilkinson
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Current price ₹4,507.00
Original price ₹5,145.00
Original price ₹5,145.00
Original price ₹5,145.00
(-12%)
₹4,507.00
Current price ₹4,507.00

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Book cover type: Paperback
  • ISBN13: 9783639166484
  • Binding: Paperback
  • Subject: N/A
  • Publisher: VDM Verlag
  • Publisher Imprint: VDM Verlag
  • Publication Date:
  • Pages: 60
  • Original Price: GBP 40.67
  • Language: English
  • Edition: N/A
  • Item Weight: 100 grams
  • BISAC Subject(s): Chemistry / Physical & Theoretical

The microlithographic process, essential in the fabrication of microdevices, uses high-energy radiation to transfer a pattern onto a thin film of polymer resist. Pattern transfer occurs by modifying the properties (solubility or volatility) of the polymer film exposed to radiation. Poly(olefin sulfones) exhibit a high sensitivity to x-rays, which is a desirable property for polymer resists used in the microlithographic process. The potential utility of these new resins prompted a study of the mechanism of degradation promoted by x- ray radiation. In this study, the effect of x-ray radiation on polysulfones with varied chemical structures was analyzed using x-ray absorption near- edge structure (XANES) spectroscopy and in-situ mass spectroscopy (MS). Interesting differences in the mode of degradation of certain poly(olefin sulfones) was observed. The results provide important groundwork for further studies of polysulfones as x- ray resists.

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